The main contributions of this proposal needed the construction of experimental facilities, the development of theoretical models and the interpretation of considerable measurements, to obtain an auto-regulated regime of an atomic monolayer by growth cycle for a given semiconductor. The original technique used is called "Isothermic Sublimation at short distance", and it has given rise to the request of a patent, it allows using low cost equipment and obtaining and studying in practice the morphology evolution in the growth of crystals.

• -A novel technique that constitutes an international contribution, to obtain very thin layers, from an auto-regulated physical mechanism and with a substantially cheap team.
• -A procedure or method to calculate the thickness of very thin layers, from the reflectance spectra.
• -The clarification of several aspects related to tension relaxation in the evolution of surface's morphology during growth.
• -The observation and interpretation of interactions of metals and semiconductors. .

The authors present 9 publications in the last 3 years. All of them of high international level and high impact index, such as Journal of Crystal Growth, Physics of State Solide, Modern Physics Letters B, Surface Review and Letters, Applied Physics Letters.

It stands out, particularly, the article of Applied Physics Letters, which is one of the most prestigious Physics Magazines in the world, and this work was also selected for Virtual Journal of Nanoscale Science and Technology, which is a compilation of links to articles about frontier researches in Nanotechnology.